Panoptes IM is an end-to-end image metrology solution that covers from image processing, metrology to analytics. You can extract more information based on highly precise and repeatable measurements with less hassles.
anoptes IM is an end-to-end image metrology solution that covers from image processing, metrology to analytics. You can extract more information based on highly precise and repeatable measurements with less hassles.
anoptes IM is an end-to-end image metrology solution that covers from image processing, metrology to analytics. You can extract more information based on highly precise and repeatable measurements with less hassles.
Fab engineers measure a variety of structural information from more diverse images in finer details under poorer image quality. The growing complexity has revealed three recurring pain points that hinder effective image metrology.
Low Precision
due to inconsistent measurement locations and methods across users
Limited Information
relying on human perceptionand manual effort
Dispersed Tools
across different equipmentand diverse image types
Low Precision
due to inconsistent measurement locations and methods across users
Limited Information
relying on human perceptionand manual effort
Dispersed Tools
across different equipmentand diverse image types
Fab engineers measure a variety of structural information from more diverse images in finer details under poorer image quality. The growing complexity has revealed three recurring pain points that hinder effective image metrology.
Low Precision
due to inconsistent measurement locations and methods across users
Limited Information
relying on human perceptionand manual effort
Dispersed Tools
across different equipmentand diverse image types
Low Precision
due to inconsistent measurement locations and methods across users
Limited Information
relying on human perceptionand manual effort
Dispersed Tools
across different equipmentand diverse image types
Panoptes IM is an AI-powered image metrology platform designed to handle and analyze all types of images. It spans image processing, metrology, and analytics to extract precise measurements and actionable insights from images.
Component is the basic functional unit of Panoptes IM, performing tasks from image processing to metrology and analytics. Users can customize the workflow flexibly in a way that is best suited for each image type.
Optimize component combination
Integrate components seamlessly
Component is the basic functional unit of Panoptes IM, performing tasks from image processing to metrology and analytics. Users can customize the workflow flexibly in a way that is best suited for each image type.
Optimize
component
combination
Integrate
components
seamlessly
IOptimize component combination
Integrate with other tools seamlessly
Panoptes IM offers various components from image processing to metrology & inspection and analytics & monitoring. Equipped with state-of-the-art AI technologies, different combination s of images derive various insights and discoveries from the image. Users can benefit from the automated features that can maximize productivity.
High Precision with Repeatability
using AI to measure consistently across users and images
Optimized
Workflow
from automating repetitive tasks and extracting various metrics instantly
Maximized Resource Usage
with seamless integration of other tools and component customization
High Precision with Repeatability
using AI to measure consistently across users and images
Optimized Workflow
from automating repetitive tasks and extracting various metrics instantly
Maximized Resource Usage
with seamless integration of other tools and component customization
[Publication]Kim, Yonghyun, et al. "SiliconBASE: Multi-task baseline model for semiconductor metrology and inspection applications." SPIE Advanced Lithography & Patterning (2025) Learn More
[Publication]Kim, Yonghyun, et al. "Universal denoiser to improve metrology throughput." SPIE Advanced Lithography & Patterning (2024)Learn More
[Publication]Bae, Jaehyeok, et al. "PNI: Industrial anomaly detection using position and neighborhood information." IEEE/CVF International Conference on Computer Vision (2023)Learn More
[Publication]Kim, Yonghyun, et al. "SiliconBASE: Multi-task baseline model for semiconductor metrology and inspection applications." SPIE Advanced Lithography & Patterning (2025) Learn More
[Publication]Kim, Yonghyun, et al. "Universal denoiser to improve metrology throughput." SPIE Advanced Lithography & Patterning (2024)Learn More
[Publication]ae, Jaehyeok, et al. "PNI: Industrial anomaly detection using position and neighborhood information." IEEE/CVF International Conference on Computer Vision (2023)Learn More
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